4$f$ electron temperature driven ultrafast electron localization
Kohei Yamagami, Hiroki Ueda, Urs Staub, Yujun Zhang, Kohei Yamamoto,, Sang Han Park, Soonnam Kwon, Akihiro Mitsuda, Hirofumi Wada, Takayuki Uozumi,, Kojiro Mimura, and Hiroki Wadati

TL;DR
This study investigates how ultrafast photoexcitation causes 4f electron localization in EuNi2(Si,Ge)2 by tracking electron temperature changes with X-ray absorption spectroscopy, revealing non-linear valence dynamics on sub-picosecond timescales.
Contribution
It introduces a method to directly measure the time-dependent 4f electron temperature and valence state changes during ultrafast excitation in a mixed-valence metal.
Findings
Photoexcitation induces a population change in Eu 4f multiplet states.
The 4f electron temperature increases, leading to electron localization.
The valence change exhibits strong non-linearity dependent on excitation fluence.
Abstract
Valence transitions in strongly correlated electron systems are caused by orbital hybridization and Coulomb interactions between localized and delocalized electrons. The transition can be triggered by changes in the electronic structure and is sensitive to temperature variations, applications of magnetic fields, and physical or chemical pressure. Launching the transition by photoelectric fields can directly excite the electronic states and thus provides an ideal platform to study the correlation among electrons on ultrafast timescales. The EuNi(SiGe) mixed-valence metal is an ideal material to investigate the valence transition of the Eu ions via the amplified orbital hybridization by the photoelectric field on sub-picosecond timescales. A direct view on the 4 electron occupancy of the Eu ions is required to understand the microscopic origin of the…
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Taxonomy
TopicsMagnetic properties of thin films · Advanced Chemical Physics Studies · Crystallography and Radiation Phenomena
