Scalable and Stable Ferroelectric Non-Volatile Memory at > 500 $^\circ$C
Dhiren K. Pradhan, David C. Moore, Gwangwoo Kim, Yunfei He, Pariasadat, Musavigharavi, Kwan-Ho Kim, Nishant Sharma, Zirun Han, Xingyu Du, Venkata S., Puli, Eric A. Stach, W. Joshua Kennedy, Nicholas R. Glavin, Roy H. Olsson, III, Deep Jariwala

TL;DR
This paper demonstrates a ferroelectric non-volatile memory device using AlScN that reliably operates above 500°C, showing stable switching, high polarization, and compatibility with high-temperature electronics, addressing a critical gap in high-T resilient memory.
Contribution
It introduces a high-temperature ferroelectric NVM device based on AlScN that operates reliably at temperatures exceeding 500°C, with stable polarization and low operating voltages.
Findings
Reliable operation up to 600°C with clear ferroelectric switching.
High remnant polarization (> 100 μC/cm²) stable at high temperatures.
Over 1 million read cycles at 500°C with stable On-Off ratio.
Abstract
Non-volatile memory (NVM) devices that reliably operate at temperatures above 300 C are currently non-existent and remains a critically unmet challenge in the development of high-temperature (T) resilient electronics, necessary for many emerging, complex computing and sensing in harsh environments. Ferroelectric AlScN exhibits strong potential for utilization in NVM devices operating at very high temperatures (> 500 C) given its stable and high remnant polarization (PR) above 100 C/cm with demonstrated ferroelectric transition temperature (TC) > 1000 C. Here, we demonstrate an AlScN ferroelectric diode based NVM device that can reliably operate with clear ferroelectric switching up to 600 C with distinguishable On and Off states. The coercive field (EC) from the Pulsed I-V measurements is found to be -5.84 (EC-) and…
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Taxonomy
TopicsAcoustic Wave Resonator Technologies · Semiconductor materials and devices · Ferroelectric and Negative Capacitance Devices
