Indirect-to-direct bandgap transition in few-layer $\beta$-InSe as probed by photoluminescence spectroscopy
Bogdan R. Borodin, Ilya A. Eliseyev, Aidar I. Galimov, Lyubov V., Kotova, Mikhail V. Durnev, Tatiana V. Shubina, and Maxim V. Rakhlin

TL;DR
This study investigates the transition from indirect to direct bandgap in few-layer $eta$-InSe using photoluminescence spectroscopy, revealing a critical thickness range of 16-20 monolayers where optical properties are optimized for light-emitting applications.
Contribution
The paper provides experimental evidence of the indirect-to-direct bandgap transition in few-layer $eta$-InSe through detailed PL and TRPL analysis, identifying the critical thickness range for optoelectronic applications.
Findings
Sharp increase in PL intensity at 16-20 MLs
Identification of three distinct PL decay times
Transition from defect-assisted to band-edge recombination
Abstract
InSe is a promising material for a next-generation of two-dimensional electronic and optical devices, characteristics of which are largely determined by the type of band structure, direct or indirect. In general, different methods can be sensitive to different peculiarities of the electronic structure leading to different results. In this work, we will focus on the luminescent properties of few-layer -InSe with a thickness of 6 to 75 monolayers (ML). Low-temperature micro-photoluminescence (-PL) studies show a sharp increase in PL intensity in the range of thicknesses from 16 to 20 monolayers, where, in addition, there is a singularity in the dependence of the work function on the thickness. Time-resolved photoluminescence spectroscopy (TRPL) reveals three characteristic PL decay times that differ from each other by about an order of magnitude. We associate the processes…
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Taxonomy
TopicsChalcogenide Semiconductor Thin Films · 2D Materials and Applications · Solid-state spectroscopy and crystallography
