Nanopore-patterned CuSe drives the realization of PbSe-CuSe lateral heterostructure
Bo Li, Jing Wang, Qilong Wu, Qiwei Tian, Ping Li, Li Zhang, Long-Jing, Yin, Yuan Tian, Ping Kwan Johnny Wong, Zhihui Qin, and Lijie Zhang

TL;DR
This paper presents a novel two-step molecular beam epitaxy method to create high-quality monolayer PbSe-CuSe lateral heterostructures with atomically sharp interfaces, enabling exploration of topological quantum phenomena.
Contribution
It introduces a nanopore-patterned CuSe template for lateral epitaxial growth of PbSe, achieving monolayer heterostructures with preserved topological properties.
Findings
Monolayer PbSe-CuSe heterostructure exhibits a 1.8 eV band gap.
Atomically sharp interfaces confirmed by microscopy and spectroscopy.
Weak substrate interaction supported by DFT calculations.
Abstract
Monolayer PbSe has been predicted to be a two-dimensional (2D) topological crystalline insulator (TCI) with crystalline symmetry-protected Dirac-cone-like edge states. Recently, few-layered epitaxial PbSe has been grown on the SrTiO3 substrate successfully, but the corresponding signature of the TCI was only observed for films not thinner than seven monolayers, largely due to interfacial strain. Here, we demonstrate a two-step method based on molecular beam epitaxy for the growth of the PbSe-CuSe lateral heterostructure on the Cu(111) substrate, in which we observe a nanopore patterned CuSe layer that acts as the template for lateral epitaxial growth of PbSe. This further results in a monolayer PbSe-CuSe lateral heterostructure with an atomically sharp interface. Scanning tunneling microscopy and spectroscopy measurements reveal a four-fold symmetric square lattice of such monolayer…
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