Thermoelectric properties and electronic structure of Cr(Mo,V)Nx thin films studied by synchrotron and lab-based X-ray spectroscopy
Susmita Chowdhury, Victor Hjort, Rui Shu, Grzegorz Greczynski, Arnaud, le Febvrier, Per Eklund, and Martin Magnuson

TL;DR
This study explores how alloying and nitrogen vacancies influence the electronic structure and thermoelectric performance of chromium-based nitride thin films, revealing pathways for optimizing thermoelectric properties through band engineering.
Contribution
It provides new insights into the effects of V and Mo alloying and nitrogen vacancies on the electronic and thermoelectric properties of CrNx thin films, guiding future material design.
Findings
Alloying V enhances thermoelectric power factor.
Mo alloying increases density of states at Fermi level.
Nitrogen vacancies reduce charge transfer and affect electrical resistivity.
Abstract
Chromium-based nitrides are used in hard, resilient coatings, and show promise for thermoelectric applications due to their combination of structural, thermal, and electronic properties. Here, we investigated the electronic structures and chemical bonding correlated to the thermoelectric properties of epitaxially grown chromium-based multicomponent nitride Cr(Mo,V)Nx thin films. Due to minuscule N vacancies, finite population of Cr 3d and N 2p states appear at the Fermi level and diminishes the band opening for Cr0.51N0.49. Incorporating holes by alloying V in N deficient CrN matrix results in enhanced thermoelectric power factor with marginal change in the charge transfer of Cr to N compared to Cr0.51N0.49. Further alloying Mo isoelectronic to Cr increases the density of states across the Fermi level due to hybridization of the (Cr, V) 3d and Mo 4d-N 2p states in Cr(Mo,V)Nx. The…
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Taxonomy
TopicsMetal and Thin Film Mechanics · MXene and MAX Phase Materials · Machine Learning in Materials Science
