Polarization sensitivity in scattering-type scanning near-field optical microscopy -- towards nanoellipsometry
Felix G. Kaps (1 ad 2), Susanne C. Kehr (1), Lukas M. Eng (1, 2), ((1) Institute of Applied Physics TUD Dresden University of Technology, (2), W\"urzburg-Dresden Cluster of Excellence - EXC 2147)

TL;DR
This paper demonstrates how polarization control in scattering-type near-field optical microscopy enables detailed analysis of in-plane and out-of-plane electric field components, advancing nanoellipsometry by linking near-field signals to sample permittivity.
Contribution
It introduces a combined theoretical and experimental approach to utilize polarization control for vectorial near-field component analysis in s-SNOM.
Findings
Polarization control allows selective coupling to sample permittivity tensor components.
Experimental data matches simulation, confirming the approach.
Disentangling near-field components provides insights into local permittivity.
Abstract
Electric field enhancement mediated through sharp tips in scattering-type scanning near-field optical microscopy (s-SNOM) enables optical material analysis down to the 10-nm length scale, and even below. Nevertheless, mostly the out-of-plane electric field component is considered here due to the lightning rod effect of the elongated s-SNOM tip being orders of magnitude stronger as compared to any in-plane field component. Nonetheless, the fundamental understanding of resonantly excited near-field coupled systems clearly allows us to take profit from all vectorial components, especially also from the in-plane ones. In this paper, we theoretically and experimentally explore how linear polarization control of both near-field illumination and detection, can constructively be implemented to (non-)resonantly couple to selected sample permittivity tensor components, e.g. explicitly also to the…
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Taxonomy
TopicsNear-Field Optical Microscopy · Plasmonic and Surface Plasmon Research · Photonic and Optical Devices
