Improved placement precision of implanted donor spin qubits in silicon using molecule ions
Danielle Holmes (1), Benjamin Wilhelm (1), Alexander M. Jakob (2), Xi Yu (1), Fay E. Hudson (1,3), Kohei M. Itoh (4), Andrew S. Dzurak (1,3), David N. Jamieson (2), Andrea Morello (1) ((1) CQC2T, School of Electrical Engineering, Telecommunications, UNSW Sydney, Australia

TL;DR
This paper demonstrates that implanting molecule ions, specifically PF$_2^+$, improves the placement precision of donor spin qubits in silicon, maintaining high coherence times and avoiding magnetic noise from fluorine nuclei.
Contribution
The study introduces the use of molecule ions for donor implantation in silicon, enhancing placement accuracy without compromising qubit coherence, and verifies minimal fluorine diffusion near the qubits.
Findings
Molecule ion implantation increases detection confidence for donor placement.
PF$_2^+$ ions produce high-quality P donor qubits with coherence times comparable to traditional methods.
No fluorine nuclear spins were detected near P donors, indicating minimal magnetic noise influence.
Abstract
Donor spins in silicon-28 (Si) are among the most performant qubits in the solid state, offering record coherence times and gate fidelities above 99%. Donor spin qubits can be fabricated using the semiconductor-industry compatible method of deterministic ion implantation. Here we show that the precision of this fabrication method can be boosted by implanting molecule ions instead of single atoms. The bystander ions, co-implanted with the dopant of interest, carry additional kinetic energy and thus increase the detection confidence of deterministic donor implantation employing single ion detectors to signal the induced electron-hole pairs. This allows the placement uncertainty of donor qubits to be minimised without compromising on detection confidence. We investigate the suitability of phosphorus difluoride (PF) molecule ions to produce high quality P donor qubits. Since…
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Taxonomy
TopicsQuantum and electron transport phenomena · Semiconductor materials and devices · Diamond and Carbon-based Materials Research
