Unravelling metallic contaminants in complex polyimide heterostructures using deep ultraviolet spectroscopic ellipsometry

TL;DR

This study employs deep ultraviolet spectroscopic ellipsometry combined with FDTD calculations to identify and analyze metallic contaminants in complex polyimide heterostructures, revealing their impact on device performance and enabling non-destructive quality control.

Contribution

It introduces a novel application of DUV spectroscopic ellipsometry for detecting and characterizing metallic contaminants in polyimide heterostructures, advancing non-destructive metrology techniques.

Findings

Metallic contaminants are embedded within 50 nm of polyimide.

Different metals and concentrations can be distinguished using DUV SE.

Contaminant levels influence device performance and are detectable non-destructively.

Abstract

Metallic contaminants in complex heterostructures are important topics due to their significant roles in determining physical properties as well as device performance. Heterostructures of polyimide via on Al pad and Cu redistribution layer (RDL) on polyimide have shown exotic properties and are important for advanced semiconductor packaging systems. One main problem is significant leakage current variations, which affect the performance of the devices, yet the origin is far from understood. Furthermore, metal contaminations would occur at the buried interfaces and it is particularly challenging to probe them. Until now, the electronic and optical properties of complex polyimide heterostructures and the roles of metallic contaminants, especially in the deep ultraviolet (DUV) have not been studied extensively. Herewith, using spectroscopic ellipsometry (SE) in a broad DUV range supported with finite-difference time-domain (FDTD) calculations, we determine optical properties of contaminants with various concentrations and reveal their influence on device performance of under-bump vias and redistribution layer (RDL) architectures. The complex dielectric function shows varying contamination levels and different metals responsible for chip performance. Metallic contaminants are found embedded within 50 nm in the polyimide and different metals are distinguishable with varying concentrations, in agreement with contact measurements in highly complex structures. Our result shows the potency of spectroscopic ellipsometry in the DUV and paves the way for non-destructive, advanced quality control and metrology applications in integrated advanced electronics packaging systems.