Ferroelectricity in tetragonal ZrO$_2$ thin films

TL;DR

This study demonstrates ferroelectricity in epitaxial tetragonal ZrO₂ thin films, revealing how thickness, strain, and surface effects influence polarization, with potential implications for future ferroelectric applications.

Contribution

It provides the first detailed analysis of ferroelectricity in epitaxial tetragonal ZrO₂ films and explores the effects of thickness and strain on their ferroelectric properties.

Findings

Ferroelectric behavior observed up to 31 nm thickness.

Polarization decreases with increasing film thickness.

Strain and surface effects promote polarization in thin films.

Abstract

We report on the crystal structure and ferroelectric properties of epitaxial ZrO$_2$ films ranging from 7 to 42 nm thickness grown on La$_{0.67}$Sr$_{0.33}$MnO$_3$-buffered (110)-oriented SrTiO$_3$ substrate. By employing X-ray diffraction, we confirm a tetragonal phase at all investigated thicknesses, with slight in-plane strain due to the substrate in the thinnest films. Further confirmation of the tetragonal phase was obtained through Infrared absorption spectroscopy with synchrotron light, performed on ZrO$_2$ membrane transferred onto a high resistive Silicon substrate. Up to a thickness of 31 nm, the ZrO$_2$ epitaxial films exhibit ferroelectric behavior, at variance with the antiferroelectric behavior reported previously for the tetragonal phase in polycrystalline films. However, the ferroelectricity is found here to diminish with increasing film thickness, with a polarization of about 13 $\mu$C.cm$^{-2}$ and down to 1 $\mu$C.cm$^{-2}$ for 7 nm and 31 nm-thick ZrO$_2$ films, respectively. This highlights the role of thickness reduction, substrate strain, and surface effects in promoting polarization in the tetragonal ZrO$_2$ thin films. These findings provide new insights into the ferroelectric properties and structure of ZrO$_2$ thin films, and open up new directions to investigate the origin of ferroelectricity in ZrO$_2$ and to optimize this material for future applications.