High Speed Precise Refractive Index Modification for Photonic Chips through Phase Aberrated Pulsed Lasers
Bangshan Sun, Simon Moser, Alexander Jesacher, Patrick S. Salter,, Robert R. Thomson, Martin J. Booth

TL;DR
This paper introduces a novel laser writing technique that combines thermal and non-thermal methods, enabling high-speed, high-precision, high-contrast refractive index modifications in photonic chips by manipulating phase aberrations.
Contribution
It proposes a new scheme for laser-induced index modification using phase aberration control, verified through a waveguide formation model, enhancing fabrication speed and precision.
Findings
Achieves scanning speeds of 20 mm/s or higher
Produces high index contrast of 16 x 10^-3
Enables arbitrary cross-section fabrication
Abstract
Integrated photonic chips have significant potential in telecommunications, classic computing, quantum systems, and topological photonics. Direct laser writing offers unique capability for creating three-dimensional photonic devices in an optical glass chip with quick prototyping. However, existing laser writing schemes cannot create index-modified structures in glass that precisely match the laser focal shape while also achieving high scanning speed and high refractive index contrast. Here, we introduce the theory of a refractive index modification scheme that combines the advantages of both traditional non-thermal and thermal regime fabrication methods. We also propose a model of waveguide formation that was verified through a thorough study on the effects of phase aberrations on the laser focus. The presented new photonic chip fabrication scheme uses a novel focal intensity…
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Taxonomy
TopicsPhotonic Crystals and Applications · Photonic and Optical Devices · Laser Material Processing Techniques
