Frequency-dependent electron power absorption mode transitions in capacitively coupled argon-oxygen plasmas
Aranka Derzsi, Mate Vass, Ranna Masheyeva, Benedek Horvath, Zoltan, Donko, Peter Hartmann

TL;DR
This study combines experimental PROES measurements with PIC/MCC simulations to analyze how electron excitation and power absorption modes in argon-oxygen CCPs change with RF frequency, revealing distinct excitation regimes.
Contribution
It provides a detailed frequency-dependent analysis of excitation dynamics and power absorption modes in argon-oxygen plasmas using combined experimental and simulation methods.
Findings
Three excitation regimes identified: sheath-dominated, mixed, and bulk-dominated.
Excitation in the bulk region peaks at intermediate frequencies.
Power absorption contributions vary with frequency, showing mode transitions.
Abstract
Phase Resolved Optical Emission Spectroscopy (PROES) measurements combined with 1d3v Particle-in-Cell/Monte Carlo Collision (PIC/MCC) simulations are performed to investigate the excitation dynamics in low-pressure capacitively coupled plasmas (CCPs) in argon-oxygen mixtures. The system used for this study is a geometrically symmetric CCP reactor operated in a fixed mixture gas composition, at fixed pressure and voltage amplitude, with a wide range of driving RF frequencies (2MHzMHz). The measured and calculated spatio-temporal distributions of the electron impact excitation rates from the Ar ground state to the Ar state (with a wavelength of 750.4~nm) show good qualitative agreement. The distributions show significant frequency dependence, which is generally considered to be predictive of transitions in the dominant discharge operating mode. Three…
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Taxonomy
TopicsPlasma Diagnostics and Applications · Semiconductor materials and devices · Gas Sensing Nanomaterials and Sensors
