Self-supervised adversarial masking for 3D point cloud representation learning
Micha{\l} Szachniewicz, Wojciech Koz{\l}owski, Micha{\l}, Stypu{\l}kowski, Maciej Zi\k{e}ba

TL;DR
This paper introduces PointCAM, an adversarial self-supervised learning method for 3D point clouds that learns to select optimal masks, leading to improved representation learning and performance on downstream tasks.
Contribution
It proposes a novel adversarial masking approach with an online tokenizer and self-distillation, surpassing random masking methods in 3D point cloud representation learning.
Findings
Achieves state-of-the-art performance on downstream tasks
Learned masking function outperforms random masking
Demonstrates effectiveness across various 3D datasets
Abstract
Self-supervised methods have been proven effective for learning deep representations of 3D point cloud data. Although recent methods in this domain often rely on random masking of inputs, the results of this approach can be improved. We introduce PointCAM, a novel adversarial method for learning a masking function for point clouds. Our model utilizes a self-distillation framework with an online tokenizer for 3D point clouds. Compared to previous techniques that optimize patch-level and object-level objectives, we postulate applying an auxiliary network that learns how to select masks instead of choosing them randomly. Our results show that the learned masking function achieves state-of-the-art or competitive performance on various downstream tasks. The source code is available at https://github.com/szacho/pointcam.
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Taxonomy
Topics3D Shape Modeling and Analysis · Optical measurement and interference techniques · Human Pose and Action Recognition
