Millimeter-Wave Reflectionless Filters Using Advanced Thin-Film Fabrication

TL;DR

This paper presents the development of millimeter-wave reflectionless filters utilizing advanced thin-film fabrication techniques, achieving high-frequency implementation with integrated components and precise impedance matching.

Contribution

It introduces a novel implementation of millimeter-wave reflectionless filters using an advanced thin-film process with integrated MIM capacitors, bridges, and TFRs at higher frequencies than previously possible.

Findings

Achieved millimeter-wave reflectionless filters with better than 2 μm feature size.

Implemented circuits with consistent 50Ω impedance match across all frequencies.

Demonstrated high-frequency operation using integrated thin-film components.

Abstract

We report on the development of millimeter-wave, lumped-element reflectionless filters using an advanced thin-film fabrication process. Based on previously demonstrated circuit topologies capable of achieving 50{\Omega} impedance match at all frequencies, these circuits have been implemented at higher frequencies than ever before by leveraging a thin-film process with better than 2 {\mu}m feature size and integrated elements such as SiN Metal-Insulator-Metal (MIM) capacitors, bridges, and TaN Thin-Film Resistors (TFRs).