PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

TL;DR

This paper reviews the fundamental plasma processes involved in PECVD and PEALD techniques on polymer substrates, emphasizing the analysis of plasma activation and initial thin film growth, and how these can be controlled and predicted.

Contribution

It provides a comprehensive analysis linking plasma physics and surface chemistry to control film adhesion and growth on polymers, based on collaborative research efforts.

Findings

Interfacial adhesion can be effectively controlled.

Initial film growth can be predicted using analytical methods.

Plasma processes influence surface and interface properties.

Abstract

This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups in the field of plasma physics, chemistry, electric as well as mechanical engineering over the last years, mostly within the frame of the transregional project SFB-TR 87 ("Pulsed high power plasmas for the synthesis of nanostructured functional layers"). This feature article aims at bridging the gap between the understanding of plasma processes in the gas phase and the resulting surface and interface processes of the polymer. The results show that interfacial adhesion and initial film growth can be well controlled and even predicted based on the combination of analytical approaches.