Macro Placement by Wire-Mask-Guided Black-Box Optimization
Yunqi Shi, Ke Xue, Lei Song, Chao Qian

TL;DR
This paper introduces WireMask-BBO, a black-box optimization framework for macro placement in chip design, achieving shorter wirelength and faster results compared to previous methods, and capable of improving existing placements significantly.
Contribution
The paper presents a novel wire-mask-guided black-box optimization framework for macro placement, enhancing efficiency and solution quality in chip floorplanning.
Findings
Achieves significantly shorter HPWL than previous methods.
Reduces optimization time compared to existing approaches.
Can improve existing placements by up to 50% in HPWL.
Abstract
The development of very large-scale integration (VLSI) technology has posed new challenges for electronic design automation (EDA) techniques in chip floorplanning. During this process, macro placement is an important subproblem, which tries to determine the positions of all macros with the aim of minimizing half-perimeter wirelength (HPWL) and avoiding overlapping. Previous methods include packing-based, analytical and reinforcement learning methods. In this paper, we propose a new black-box optimization (BBO) framework (called WireMask-BBO) for macro placement, by using a wire-mask-guided greedy procedure for objective evaluation. Equipped with different BBO algorithms, WireMask-BBO empirically achieves significant improvements over previous methods, i.e., achieves significantly shorter HPWL by using much less time. Furthermore, it can fine-tune existing placements by treating them as…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
Taxonomy
TopicsVLSI and FPGA Design Techniques · 3D IC and TSV technologies · Advancements in Photolithography Techniques
