High temperature decomposition and age hardening of single-phase wurtzite Ti$_{1-x}$Al$_{x}$N thin films grown by cathodic arc deposition
J. Salamania, F. Bock, L.J.S. Johnson, F. Tasn\'adi, K.M. Calamba, Kwick, A.F. Farhadizaeh, I.A. Abrikosov, L. Rogstr\"om, M. Od\'en

TL;DR
This study explores the high temperature decomposition of wurtzite Ti$_{1-x}$Al$_{x}$N thin films, revealing nanoscale phase separation and age hardening effects through experimental and computational methods.
Contribution
It provides new insights into the decomposition behavior and phase stability of wurtzite Ti$_{1-x}$Al$_{x}$N films at high temperatures, combining first-principles calculations with experimental observations.
Findings
Decomposition occurs after annealing at 950°C.
Nanoscale chemical modulations form with Ti-rich and Al-rich regions.
Age hardening of 1-2 GPa is observed due to spinodal decomposition.
Abstract
We investigated the high temperature decomposition behavior of wurtzite phase TiAlN films using experimental methods and first-principles calculations. Single phase metastable wurtzite TiAlN (x = 0.65, 0.75, 085 and 0.95) solid solution films were grown by cathodic arc deposition using low duty cycle pulsed substrate-bias voltage. First-principles calculated elastic constants of the wurtzite TiAlN phase show a strong dependence on alloy composition. The predicted phase diagram shows a miscibility gap with an unstable region. High resolution scanning transmission electron microscopy and chemical mapping demonstrate decomposition of the films after high temperature annealing (950C), which resulted in nanoscale chemical compositional modulations containing Ti-rich and Al-rich regions with coherent or semi coherent interfaces. This…
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Taxonomy
TopicsMetal and Thin Film Mechanics · Semiconductor materials and devices · Copper Interconnects and Reliability
