Scalable and efficient grating couplers on low-index photonic platforms enabled by cryogenic deep silicon etching
Emma Lomonte, Maik Stappers, Linus Kr\"amer, Wolfram H.P. Pernice,, Francesco Lenzini

TL;DR
This paper introduces a novel method for creating highly efficient grating couplers on low-index photonic platforms using cryogenic deep silicon etching, achieving near-unity coupling efficiency suitable for various photonic applications.
Contribution
The authors develop a flexible strategy employing self-imaging gratings with negative diffraction angles and cryogenic etching to significantly improve coupling efficiency on low-index photonic platforms.
Findings
Achieved up to -0.55 dB coupling efficiency in the telecom C-band.
Demonstrated high device yield with near-unity chip-scale fabrication.
Validated the approach on silicon nitride platforms.
Abstract
Efficient fiber-to-chip couplers for multi-port access to photonic integrated circuits are paramount for a broad class of applications, ranging, e.g., from telecommunication to photonic computing and quantum technologies. While grating-based approaches are convenient for out-of-plane access and often desirable from a packaging point of view, on low-index photonic platforms, such as silicon nitride or thin-film lithium niobate, the limited grating strength has thus far hindered the achievement of coupling efficiencies comparable to the ones attainable in silicon photonics. Here we present a flexible strategy for the realization of highly efficient grating couplers on low-index photonic platforms. To simultaneously reach a high scattering efficiency and a near-unitary modal overlap with optical fibers, we make use of self-imaging gratings designed with a negative diffraction angle. To…
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Taxonomy
TopicsPhotonic and Optical Devices · Advanced Fiber Optic Sensors · Optical Coatings and Gratings
