Droplet nanofluidic transport under vapor deposition: a review on seeded growth of low-dimensional nanomaterials
Zheng Fan, Lei Ma

TL;DR
This review discusses how vapor phase deposition on metal droplets enables the controlled growth of low-dimensional nanomaterials, highlighting key factors influencing droplet behavior and resulting nanostructure morphologies.
Contribution
It provides a comprehensive overview of droplet evolution and nanofluidic transport mechanisms in vapor deposition, emphasizing the role of various parameters in nanomaterial growth.
Findings
Key factors affecting droplet spreading and transport identified
Deposition parameters influence nanomaterial morphology
Doping and phase transitions depend on droplet dynamics
Abstract
Thin film deposition technologies boost the development of modern semiconductor industries. Being a fancy variant, vapor phase deposition on metal nanoparticles (often in liquid phase) rather than on bare substrates opens novel avenues of fabricating low-dimensional nanomaterials, which renders the development of new device architectures and their applications in advanced electronics, optoelectronics and photonics, etc. Since the last twenty years, nanomaterials with various geometries (i.e. dots, wires, trees, tubes, flakes, ribbons, etc.) have been synthesized via different bottom-up methods (i.e. vapor-liquid-solid, vapor-solid-solid, in plane solid-liquid-solid, etc.) by different deposition techniques (CVD, PECVD, MOCVD, MBE, etc.). In contrast with liquid phase epitaxy where metal liquid severs as stationary reservoir that accommodates gaseous precursors, metal droplets have to be…
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Taxonomy
TopicsAdvanced Data Storage Technologies · Nanomaterials and Printing Technologies · Innovative Microfluidic and Catalytic Techniques Innovation
