Effect of crystal field engineering and Fermi level optimization on thermoelectric properties of Ge$_{1.01}$Te: Experimental investigation and theoretical insight
Ashutosh Kumar, Preeti Bhumla, D. Sivaprahasam, Saswata Bhattacharya,, and Nita Dragoe

TL;DR
This paper demonstrates how crystal field engineering and Fermi level optimization, combined with defect scattering, significantly enhance the thermoelectric performance of GeTe-based materials through experimental and theoretical methods.
Contribution
It introduces a novel co-doping strategy with Ti and Bi in GeTe, optimizing electronic and thermal transport properties for improved thermoelectric efficiency.
Findings
Maximum zT of 1.75 at 773 K achieved
Thermal conductivity reduced to 1.06 W/m·K at 300 K
Enhanced power factor through band structure engineering
Abstract
This study shows a method of enhancing the thermoelectric properties of GeTe-based materials by Ti and Bi co-doping on cation sites along with self-doping with Ge via simultaneous optimization of electronic (via crystal field engineering, and precise Fermi level optimization) and thermal (via point-defect scattering) transport properties. The pristine GeTe possesses high carrier concentration () due to intrinsic Ge vacancies, low Seebeck coefficient (), and high thermal conductivity (). The Ge vacancy optimization and crystal field engineering results in an enhanced via excess Ge and Ti doping, which is further improved by band structure engineering through Bi doping. As a result of improved and optimized Fermi level (carrier concentration), an enhanced power factor () is obtained for Ti--Bi co-doped GeTe. These experimental…
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Taxonomy
TopicsAdvanced Thermoelectric Materials and Devices · Phase-change materials and chalcogenides · Chalcogenide Semiconductor Thin Films
