Deposition rate controls nucleation and growth during amorphous/nanocrystalline competition in sputtered Zr-Cr thin films
Q. Liebgott (IJL), A. Borroto (IJL), Z. Fern\'andez-Guti\'errez (IJL),, S. Bruy\`ere (IJL), F. M\"ucklich, D. Horwat (IJL)

TL;DR
This study investigates how deposition rate influences the competition between amorphous and crystalline phases in sputtered Zr-based thin films, revealing how growth kinetics and microstructure are affected.
Contribution
It introduces a model for crystalline region development and compares nucleation and growth behaviors across different Zr-based alloy systems.
Findings
Deposition rate alters nucleation and growth kinetics.
Crystalline cone angle and crystallite size vary with composition.
Surface coverage by crystalline phase depends on deposition parameters.
Abstract
Dual-phase Zr-based thin films synthesized by magnetron co-sputtering and showing competitive growth between amorphous and crystalline phases have been reported recently. In such films, the amorphous phase grows as columns, while the crystalline phase grows as separated cone-shaped crystalline regions made of smaller crystallites. In this paper, we investigate this phenomenon and propose a model for the development of the crystalline regions during thin film growth. We evidence using X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM), that this competitive selfseparation also exists in co-sputtered Zr-Cr thin films with Cr contents of ~84-86 at.%, corresponding to the transition between the amorphous and crystalline compositions, and in the Zr-V system. Then, to assess the sturdiness of this phenomenon, its existence and geometrical…
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