Wafer-Scale Fabrication of Hierarchically Porous Silicon and Silica Glass by Active Nanoparticle-Assisted Chemical Etching and Pseudomorphic Thermal Oxidation
Stella Gries, Manuel Brinker, Berit Zeller-Plumhoff, Dagmar Rings,, Tobias Krekeler, Imke Greving, and Patrick Huber

TL;DR
This paper introduces a scalable method combining metal-assisted chemical etching and photolithography to create hierarchically porous silicon and silica with multiscale pores, suitable for energy, sensing, and photonic applications.
Contribution
It presents a novel, scalable fabrication process for hierarchically porous silicon and silica with bimodal pore distribution using self-organized etching and photolithography.
Findings
Successfully fabricated silicon with bimodal porosity including macropores and mesopores.
Demonstrated structure preservation during thermal oxidation to silica.
High-resolution imaging confirmed large open porosity and inner surface area.
Abstract
Many biological materials exhibit a multiscale porosity with small, mostly nanoscale pores as well as large, macroscopic capillaries to simultaneously achieve optimized mass transport capabilities and lightweight structures with large inner surfaces. Realizing such a hierarchical porosity in artificial materials necessitates often sophisticated and expensive top-down processing that limits scalability. Here we present an approach that combines self-organized porosity based on metal-assisted chemical etching (MACE) with photolithographically induced macroporosity for the synthesis of single-crystalline silicon with a bimodal pore-size distribution, i.e., hexagonally arranged cylindrical macropores with 1 micrometer diameter separated by walls that are traversed by mesopores 60 nm across. The MACE process is mainly guided by a metal-catalyzed reduction-oxidation reaction, where silver…
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