Voltage-dependent first-principles simulation of insertion of chloride ions into Al/Al$_2$O$_3$ interfaces using the Quantum Continuum Approximation
Quinn Campbell

TL;DR
This paper introduces the Quantum Continuum Approximation (QCA), a novel method combining DFT and electrostatic models to predict chloride ion insertion into aluminum oxide interfaces at various voltages, aiding corrosion understanding.
Contribution
QCA enables first-principles voltage predictions for electrochemical interfaces by reducing computational cost and coupling atomistic and continuum models.
Findings
Chloride insertion favorable at voltages > -0.2 V in systems with grain boundaries
QCA predicts corrosion onset consistent with experimental observations
Method reduces DFT atom count by an order of magnitude
Abstract
Experiments have shown that pitting corrosion can develop in aluminum surfaces at potentials V relative to the standard hydrogen electrode (SHE). Until recently, the onset of pitting corrosion in aluminum has not been rigorously explored at an atomistic scale because of the difficulty of incorporating a voltage into density functional theory (DFT) calculations. We introduce the Quantum Continuum Approximation (QCA) which self-consistently couples explicit DFT calculations of the metal-insulator and insulator-solution interfaces to continuum Poisson-Boltzmann electrostatic distributions describing the bulk of the insulating region. By decreasing the number of atoms necessary to explicitly simulate with DFT by an order of magnitude, QCA makes the first-principles prediction of the voltage of realistic electrochemical interfaces feasible. After developing this technique, we apply…
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Taxonomy
TopicsMachine Learning in Materials Science · Nuclear Physics and Applications · Non-Destructive Testing Techniques
