Observation of ultraslow hole dynamics in the 3D topological insulator Bi2Se3 coated with a thin MgF2 layer using multiphoton pumped UV-Vis transient absorption spectroscopy

TL;DR

This study observes ultraslow, long-lived hole dynamics in a Bi2Se3 topological insulator coated with MgF2, revealing how interface effects and film thickness influence carrier relaxation processes at room temperature.

Contribution

It reports the first observation of individual, ultraslow hole dynamics in Bi2Se3 using multiphoton pumped transient absorption spectroscopy, highlighting the role of the Bi2Se3/MgF2 interface.

Findings

Ultraslow hole dynamics (~200 μs) observed at room temperature.

Long rise time (~600 ps) due to large spin-orbit coupling and intervalley scattering.

Hole dynamics decrease with reducing film thickness, linked to resonance conditions.

Abstract

Individual relaxation dynamics of electrons and holes in optically pumped semiconductors is rarely observed due to their overlap. Here we report the individual dynamics of long-lived (~200 mks) holes observed at room temperature in a 10 nm thick film of the 3D topological insulator (TI) Bi2Se3 coated with a 10 nm thick MgF2 layer using transient absorption spectroscopy in the UV-Vis region. The ultraslow hole dynamics was observed by applying multiphoton resonant pumping of massless Dirac fermions and bound valence electrons in Bi2Se3 at a certain wavelength sufficient for their photoemission and subsequent trapping at the Bi2Se3/MgF2 interface. The emerging deficit of electrons in the film makes it impossible for the remaining holes to recombine, thus causing their ultraslow dynamics measured at a specific probing wavelength. We also found an extremely long rise time (~600 ps) for this ultraslow optical response, which is due to the large spin-orbit coupling (SOC) splitting at the valence band maximum and the resulting intervalley scattering between the splitting components. The ultraslow hole dynamics in Bi2Se3 due to the presence of the Bi2Se3/MgF2 interface is nevertheless much faster than the known ultraslow electron dynamics at the Si/SiO2 interface, also induced by multiphoton excitation in Si. The observed dynamics of long-lived holes is gradually suppressed with decreasing Bi2Se3 film thickness for the 2D TI Bi2Se3 (film thickness 5, 4, and 2 nm) due to the loss of resonance conditions for multiphoton photoemission caused by the gap opening at the Dirac surface state nodes. This behavior indicates that the dynamics of massive Dirac fermions predominantly determines the relaxation of photoexcited carriers for both the 2D topologically nontrivial and 2D topologically trivial insulator phases.