Electronic phase diagram of Cr-doped VO2 epitaxial films studied by in situ photoemission spectroscopy
D. Shiga (1, 2), X. Cheng (1), T. T. Kim (1), T. Kanda (1, 2),, N. Hasegawa (1), M. Kitamura (2), K. Yoshimatsu (2), and H. Kumigashira (1, and 2) ((1) Tohoku University, (2) High Energy Accelerator Research, Organization)

TL;DR
This study maps the electronic phase diagram of Cr-doped VO2 epitaxial films, revealing the interplay of Peierls and Mott mechanisms in the metal-insulator transition through in situ photoemission spectroscopy.
Contribution
It provides new insights into how Cr doping and epitaxial strain influence the electronic phases and transition mechanisms in VO2, highlighting the dominance of Mott physics at higher doping levels.
Findings
TMIT is suppressed by epitaxial strain.
Pseudogap behavior observed at x=0.08.
Mott insulating phase stabilizes at x>0.08.
Abstract
Through in situ photoemission spectroscopy (PES), we investigated the changes in the electronic structure of Cr-doped VO2 films coherently grown on TiO2 (001) substrates. The electronic phase diagram of CrxV1-xO2 is drawn by a combination of electric and spectroscopic measurements. The phase diagram is similar to that of bulk CrxV1-xO2, while the temperature of metal-insulator transition (TMIT) is significantly suppressed by the epitaxial strain effect. In the range of x = 0-0.04, where TMIT remains unchanged as a function of x, the PES spectra show dramatic change across TMIT, demonstrating the characteristic spectral changes associated with the Peierls phenomenon. In contrast, for x > 0.04, the TMIT linearly increases, and the metal-insulator transition (MIT) may disappear at x = 0.08-0.12. The PES spectra at x = 0.08 exhibit pseudogap behavior near the Fermi level, whereas the…
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Taxonomy
TopicsTransition Metal Oxide Nanomaterials · Gas Sensing Nanomaterials and Sensors · Ga2O3 and related materials
