High-yield exfoliation of MoS2 nanosheets by a novel spray technique and the importance of soaking and surfactants
Suvigya Kaushik, Siva Sankar Nemala, Mukesh Kumar, Devesh Negi,, Biswabhusan Dhal, Lalita Saini, Ramu Banavath, Surajit Saha, Sudhanshu, Sharma, Gopinadhan Kalon

TL;DR
This paper introduces a novel high-pressure liquid-phase exfoliation method for MoS2 nanosheets, emphasizing the roles of soaking and surfactants, achieving high yields and stability suitable for catalytic applications.
Contribution
It presents a new exfoliation technique that yields large quantities of stable MoS2 nanosheets, highlighting the significance of soaking time and surfactant choice, with detailed analysis of process parameters.
Findings
Achieved up to 7.25% yield of MoS2 nanosheets.
Nanosheets stable in solvents for up to six months.
High hydrogen evolution rate of 30.13 mmol g-1 h-1.
Abstract
Liquid-phase exfoliation of two-dimensional materials is very attractive for large-scale applications. Although used extensively, isolating MoS2 layers (<10) with high efficiency is reported to be extremely difficult. Further, the importance of soaking has not yet been studied, and the surfactants' role in stabilizing MoS2 nanosheets is poorly understood1. Herein, we report a novel approach to exfoliating large quantities of MoS2 via high-pressure (HP) liquid-phase exfoliation (LPE) in deionized (DI) water. 4 to 7 layers of MoS2 nanosheets were obtained from 60 days-soaked samples and they were found to be stable in solvents for periods of up to six months. Studies on the effect of three surfactants, namely sodium dodecyl benzenesulfonate (SDBS), sodium cholate (SC), and tetra-butyl ammonium bromide (TBAB), indicate that exfoliation of MoS2 nanosheets in SDBS is highly efficient than…
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