Ionization dynamics and damage conditions for transparent materials irradiated with Mid-Infrared femtosecond pulses
George D Tsibidis, Emmanuel Stratakis

TL;DR
This study investigates how mid-infrared femtosecond laser pulses interact with transparent materials, analyzing ionization and damage thresholds to enable improved laser patterning techniques in optics and photonics.
Contribution
It provides a comprehensive analysis of ionization dynamics and damage conditions for dielectric materials under mid-IR femtosecond irradiation, highlighting the scaling laws and surface plasmon effects.
Findings
Damage threshold scales with pulse duration as ~τ_p^α (0.31<α<0.37).
Electron density correlates with surface plasmon excitation and threshold (~τ_p^β, 0.33<β<0.39).
Optimal conditions for laser-induced damage and patterning are identified.
Abstract
The employment of ultrashort laser sources at the mid-IR spectral region for transparent materials is designed to open new routes for laser patterning and a wealth of exciting applications in optics and photonics. To elucidate the material response to irradiation with mid-IR laser sources, a consistent analysis of the interaction of long wavelength femtosecond pulses with dielectric materials is presented. The influence of the pulse duration is, in particularly, emphasized towards specifying the laser parameters for which photoionization and impact ionization are important. Simulations results using pulses at 2.2 mum, 3.2 mum and 5 mum are conducted to illustrate the optimum conditions for the onset of damage on the solid that is related to the occurrence of the optical breakdown. Results predict that the damage threshold scales as ~ (0.31<<0.37) at all laser…
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Taxonomy
TopicsLaser Material Processing Techniques · Laser-induced spectroscopy and plasma · Laser-Matter Interactions and Applications
