Combined breakdown of a dielectric nanolayer to form a Josephson bridge

TL;DR

This paper explores a novel method of forming Josephson bridges by combining dielectric nanolayer breakdowns under specific electrical conditions, revealing a new formation mechanism influenced by preliminary breakdowns and film thickness.

Contribution

It introduces a new process for creating Josephson bridges through combined dielectric breakdown, highlighting the role of auto breakdowns and film thickness in the formation mechanism.

Findings

Reproducible Josephson bridges with resistance > 1 Ω formed.

Discovery of a new formation mechanism involving preliminary breakdowns.

The process is influenced by the dielectric nanolayer thickness.

Abstract

Electrical breakdown of a dielectric nanolayer between film electrodes under the combined action of direct current and capacitor discharge current makes it possible to form Josephson bridges with a reproducible resistance exceeding 1 {\Omega}. A new feature of the formation of a bridge during electrical breakdown, which is preceded by a series of preliminary breakdowns (auto breakdowns) of a dielectric nanolayer, has been discovered. The mechanism of the process and the role of the thickness of the cathode film in the formation of the bridge are discussed.