Ionic modulation at the LaAlO$_3$/KTaO$_3$ interface for extreme high-mobility two-dimensional electron gas
H. Yan, S.W. Zeng, K. Rubi, G. J. Omar, Z. T. Zhang, M. Goiran, W., Escoffier, and A. Ariando

TL;DR
This study demonstrates extremely high electron mobility at the LaAlO$_3$/KTaO$_3$ interface achieved through ionic-liquid gating, revealing new potential for high-performance oxide electronics by reducing interface disorder.
Contribution
It introduces ionic-liquid gating as a method to significantly enhance mobility in 5d-oxide 2DESs, surpassing previous systems and providing insights into the electronic sub-band structure.
Findings
Achieved electron mobility of ~22650 cm$^2$V$^{-1}$s$^{-1}$ at room temperature.
Mobility follows a power-law dependence on carrier density, $bc \, n^{1.2}$.
Quantum oscillations confirm electrons occupy Ta:5d orbital sub-bands.
Abstract
Due to the coexistence of many emergent phenomena, including 2D superconductivity and a large Rashba spin-orbit coupling, 5d transition metal oxides based two-dimensional electron systems (2DESs) have been prospected as one of the potential intrants for modern electronics. However, despite the lighter electron mass, the mobility of carriers, a key requisite for high-performance devices, in 5d-oxides devices remains far behind their 3d-oxides analogs. The carriers mobility in these oxides is significantly hampered by the inevitable presence of defects generated during the growth process. Here, we report very high mobility ( 22650 cmVs) of 5d-2DES confined at the LaAlO/KTaO interface. The high mobility, which is beyond the values observed in LaAlO/SrTiO and -AlO/SrTiO systems in the same carrier-density range, is achieved using…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsElectronic and Structural Properties of Oxides · Semiconductor materials and devices · Catalytic Processes in Materials Science
