Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers

TL;DR

This paper presents a novel electron-beam lithography process for creating nanoscale metallic gates on fragile scanning probe cantilevers, enabling enhanced sensor functionality without compromising sensitivity.

Contribution

It introduces a floating-layer technique for resist coating and demonstrates successful patterning of nanoscale devices on cantilever tips, preserving their force sensitivity.

Findings

Successful fabrication of nanoscale metallic gates on cantilevers

Maintained high force sensitivity after patterning

Extended functionality of scanning probes as sensors

Abstract

We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in electron-beam resist. We demonstrate gate definition through a lift-off process, as well as through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.