Vlasov Simulation of Emissive Plasma Sheath with Energy-Dependent Secondary Emission Coefficient and Improved Modeling for Dielectric Charging Effects
Guang-Yu Sun, Shu Zhang, Bao-Hong Guo, An-Bang Sun, Guan-Jun Zhang

TL;DR
This study uses Vlasov simulations to explore plasma sheaths with energy-dependent secondary electron emission and dielectric charging, revealing nonlinear sheath behavior and saturation effects at high electron temperatures.
Contribution
It introduces an improved SEE model accounting for wall charging and energy dependence, enhancing the accuracy of plasma sheath simulations.
Findings
SEE coefficient increases with wall charge
Sheath potential becomes nonlinear with electron temperature
Space charge limited sheath forms at high temperatures
Abstract
A one dimensional Vlasov Poisson simulation code is employed to investigate the plasma sheath considering electron induced secondary electron emission (SEE) and backscattering. The SEE coefficient is commonly treated as constant in a range of plasma simulations, here improved SEE model of a charged dielectric wall is constructed which includes the wall charging effect on SEE coefficient and the energy dependency of SEE coefficient. Pertinent algorithms to implement above SEE model in plasma simulation are studied in detail. It is found that the SEE coefficient increases with the amount of negative wall charges, which in turn reduces the emissive sheath potential. With energy dependent SEE coefficient, the sheath potential is a nonlinear function of the plasma electron temperature, as opposed to the linear relation predicted by classic emissive sheath theory. Simulation combining both…
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Taxonomy
TopicsPlasma Diagnostics and Applications · Semiconductor materials and devices · Metal and Thin Film Mechanics
