Distinguishing the EH1 and S1 defects in n-type 4H-SiC by Laplace DLTS
Tihomir Kne\v{z}evi\'c, Tomislav Brodar, Vladimir Radulovi\'c, Luka, Snoj, Takahiro Makino, and Ivana Capan

TL;DR
This study uses Laplace DLTS to differentiate between two specific defects, EH1 and S1, in irradiated 4H-SiC, revealing their distinct emission line signatures and aiding defect identification.
Contribution
The paper demonstrates the effectiveness of Laplace DLTS in distinguishing EH1 and S1 defects in 4H-SiC, providing detailed emission line analysis for each defect.
Findings
EH1 shows a single emission line from Ci(h)
S1 exhibits two emission lines from VSi(h) and VSi(k)
Laplace DLTS can effectively differentiate these defects
Abstract
We report on the low-energy electron and fast neutron irradiated 4H-SiC studied by deep-level transient spectroscopy (DLTS) and Laplace DLTS. Irradiations introduced two defects, Ec-0.4eV and Ec-0.7eV. They were previously assigned to carbon interstitial (Ci) labeled as EH1/3 and silicon-vacancy (VSi) labeled as S1/2, for the low-energy electron and fast neutron irradiation, respectively. This work demonstrates how Laplace DLTS can be used as a useful tool for distinguishing the EH1 and S1 defects. We show that EH1 consists of a single emission line arising from the Ci(h), while S1 has two emission lines arising from the VSi(h) and VSi(k) lattice sites.
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Taxonomy
TopicsSilicon Carbide Semiconductor Technologies · Thin-Film Transistor Technologies · Ga2O3 and related materials
