Atomic mechanisms of self-diffusion in amorphous silicon
Matthias Posselt, Hartmut Bracht, Mahdi Ghorbani-Asl, Drazen Radi\'c

TL;DR
This study investigates atomic self-diffusion mechanisms in amorphous silicon using molecular dynamics simulations, revealing complex bond rearrangements and neighbor exchanges that are not directly linked to defect concentrations.
Contribution
It provides a detailed atomic-level analysis of self-diffusion mechanisms in amorphous silicon, highlighting the role of bond rearrangements and neighbor exchanges, and compares different interatomic potentials.
Findings
Diffusional and vibrational contributions to displacement are separable.
No direct correlation between defect concentration and diffusion.
Diffusion involves complex bond rearrangements and neighbor exchanges.
Abstract
Based on recent calculations of the self-diffusion (SD) coefficient in amorphous silicon (a-Si) by classical Molecular Dynamics simulation [M. Posselt, H. Bracht, and D. Radi\'c, J. Appl. Phys. 131, 035102 (2022)] detailed investigations on atomic mechanisms are performed. For this purpose two Stillinger-Weber-type potentials are employed, one strongly overestimates the SD coefficient, while the other leads to values much closer to the experimental data. By taking into account the individual squared displacements (or diffusion lengths) of atoms the diffusional and vibrational contributions to the total mean squared displacement can be determined separately. It is shown that the diffusional part is not directly correlated with the concentration of coordination defects. The time-dependent distribution of squared displacements of atoms indicates that in a-Si a well-defined elemental…
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Taxonomy
TopicsSilicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies · Thin-Film Transistor Technologies
