Electron spin transport in a metal-oxide-semiconductor Si two-dimensional inversion channel: Effect of hydrogen annealing on spin scattering mechanism and spin lifetime
Shoichi Sato, Masaaki Tanaka, and Ryosho Nakane

TL;DR
This study investigates how hydrogen annealing influences electron spin transport, scattering mechanisms, and spin lifetime in a silicon-based two-dimensional inversion channel, providing insights for spintronic device optimization.
Contribution
It reveals the effects of hydrogen annealing on spin scattering mechanisms and enhances understanding of spin lifetime in silicon inversion channels.
Findings
Hydrogen annealing reduces spin scattering in silicon channels.
Spin lifetime is significantly affected by annealing conditions.
The study offers guidance for improving spintronic device performance.
Abstract
Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan Center for Spintronics Research Network (CSRN), The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsSemiconductor materials and devices · Quantum and electron transport phenomena · Advancements in Semiconductor Devices and Circuit Design
