Deposition of the stoichiometric coatings by reactive magnetron sputtering

TL;DR

This paper investigates reactive magnetron sputtering for depositing stoichiometric metal-metalloid coatings, analyzing process parameters, surface chemistry, and coating properties to improve stability and controllability.

Contribution

It provides experimental data and insights into the deposition of AlN, Al2O3, TiN, and TiO2 coatings, highlighting process dependencies and stability features.

Findings

Dependence of sputtering parameters on coating formation

Successful deposition of stoichiometric AlN, Al2O3, TiN, TiO2 coatings

Enhanced stability and controllability of the deposition process

Abstract

The investigations of the reactive magnetron depositing of the stoichiometric coatings metal-metalloid were done. The dependences between sputtering parameters of a target and processes of plasmochemical formation on the surface of sample metal-metalloid and formations of coatings of the appropriate structure were investigated. Experimental data on stoichiometric coatings AlN, Al2O3, TiN, TiO2 is given. Features of reactive magnetron deposition and investigation results for obtaining of coatings with pregiven properties in particular for providing stability and controllability of coating deposition processes in time. Keywords: reactive magnetron sputtering, coatings, oxide, nitride compositions.