Self-probed ptychography from semiconductor high-harmonic generation

TL;DR

This paper introduces a novel self-probing ptychography method utilizing semiconductor high-harmonic generation to achieve nanoscale imaging of objects, combining high-resolution diffraction with ultrafast coherent light sources.

Contribution

It presents a new in situ imaging technique that integrates ptychography with high-harmonic generation from crystals, enabling structural analysis of nano-patterned objects.

Findings

Successful demonstration of ptychography with crystal high-harmonics

Structural information obtained from nano-patterned crystals

Potential for compact, short-wavelength light sources in nanoscale imaging

Abstract

We demonstrate a method to image an object using a self-probing approach based on semiconductor high-harmonic generation. On one hand, ptychography enables high-resolution imaging from the coherent light diffracted by an object. On the other hand, high-harmonic generation from crystals is emerging as a new source of extreme-ultraviolet ultrafast coherent light. We combine these two techniques by performing ptychography measurements with nano-patterned crystals serving as the object as well as the generation medium of the harmonics. We demonstrate that this strong field in situ approach can provide structural information about the object. With the future developments of crystal high harmonics as a compact short-wavelength light source, our demonstration can be an innovative approach for nanoscale imaging of photonic and electronic devices in research and industry.