Structure and electrical behavior of silicon nanowires prepared by MACE process
R. Plugaru, E. Fakhri, C. Romanitan, I. Mihalache, G. Craciun, N., Plugaru, H. \"O. \'Arnason, M. T. Sultan, G. A. Nemnes, S. Ingvarsson, H. G., Svavarsson, A. Manolescu

TL;DR
This study investigates the structure and electrical properties of silicon nanowires made by MACE, revealing defect-related photoluminescence, memristive behavior, and trap states influencing their electrical response.
Contribution
It provides detailed analysis of the structural defects, electrical behavior, and trap states in silicon nanowires prepared by MACE, highlighting their memristive properties and defect-related photoluminescence.
Findings
Nanowires show merged arrays with lengths of 700 nm and 1000 nm.
Photoluminescence indicates defect-related emission bands at 1.70 eV and 1.61 eV.
Electrical measurements reveal memristive behavior influenced by trap states.
Abstract
We report on the structure and electrical characteristics of silicon nanowire arrays prepared by metal assisted chemical etching (MACE) method, investigated by cross-sectional scanning electron microscopy (SEM) and high resolution X-ray diffraction (HR-XRD) methods. SEM micrographs show arrays of merged parallel nanowires, with lengths of 700 nm and 1000 nm, resulted after 1.5 min and 5 min etching time, respectively. X-ray reciprocal space maps (RSMs) around Si (004) reciprocal lattice point indicate the presence of 0D structural defects rather than of extended defects. The photoluminescence spectra exhibit emission bands at 1.70 eV and 1.61 eV, with intensity significantly higher in the case of longer wires and associated with the more defected surface. The transient photoluminescence spectroscopy reveals average lifetime of 60 s and 111 s for the two SiNW arrays, which…
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Taxonomy
TopicsNanowire Synthesis and Applications · Semiconductor materials and interfaces · Advancements in Semiconductor Devices and Circuit Design
