All-BN Distributed Bragg Reflectors Fabricated in a Single MOCVD Process
Arkadiusz Ciesielski (1), Jakub Iwa\'nski (1), Piotr Wr\'obel (1),, Rafa{\l} Bo\.zek (1), S{\l}awomir Kret (2), Jakub Turczy\'nski (2), Johannes, Binder (1), Krzysztof P. Korona (1), Roman St\k{e}pniewski (1), Andrzej, Wysmo{\l}ek (1) ((1) University of Warsaw

TL;DR
This paper presents a novel method to fabricate all-boron nitride distributed Bragg reflectors using a single MOCVD process, enabling tunable optical properties without post-processing, suitable for integrated photonic applications.
Contribution
The study introduces a single-step MOCVD fabrication of all-BN DBRs with high reflectance and tunable wavelength, eliminating the need for etching or multiple materials.
Findings
Achieved 87% reflectance with 15.5 BN layer pairs.
Tunable reflectance wavelength from 500 nm to IR.
Demonstrated use in optical microcavities for photonic devices.
Abstract
Distributed Bragg Reflectors (DBR) are well-established photonic structures that are used in many photonic applications. However, most of the DBRs are based on different materials or require post-process etching which can hinder integration with other components in the final photonic structure. Here, we demonstrate the fabrication of DBR structures consisting only of undoped boron nitride (BN) layers with high refractive index contrast by using Metal-Organic Chemical Vapor Deposition (MOCVD). This has been achieved in a single process, without the need for any post-process etching. The difference in the refractive index of the component BN layers stems from different degrees of porosity of the individual BN layers, which is a direct result of a different growth temperature. The fabricated DBR structures consist of 15.5 pairs of BN layers and exhibit a reflectance of 87+/-1% at the…
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Taxonomy
TopicsAdvanced Fiber Laser Technologies · Photonic and Optical Devices · Advanced Fiber Optic Sensors
