Geometrical magnetoresistance effect and mobility in graphene field-effect transistors
Isabel Harrysson Rodrigues, Andrey Generalov, Anamul Md Hoque, Miika, Soikkeli, Anton Murros, Sanna Arpiainen, and Andrei Vorobiev

TL;DR
This paper introduces a geometrical magnetoresistance method to accurately measure charge carrier mobility in graphene FETs, overcoming limitations of traditional approaches and revealing insights into scattering mechanisms.
Contribution
The study presents a novel, assumption-free technique using gMR to evaluate mobility in GFETs, improving accuracy over conventional methods.
Findings
gMR effect dominates up to ~0.55 T magnetic field
gMR mobility is 2-3 times higher than drain resistance model estimates
Mobility variations linked to Coulomb and phonon scattering mechanisms
Abstract
Further development of the graphene field-effect transistors (GFETs) for high-frequency electronics requires accurate evaluation and study of the mobility of charge carriers in a specific device. Here, we demonstrate that the mobility in the GFETs can be directly characterized and studied using the geometrical magnetoresistance (gMR) effect. The method is free from the limitations of other approaches since it does not require an assumption of the constant mobility and the knowledge of the gate capacitance. Studies of a few sets of GFETs in the wide range of transverse magnetic fields indicate that the gMR effect dominates up to approximately 0.55 T. In higher fields, the physical magnetoresistance effect starts to contribute. The advantages of the gMR approach allowed us to interpret the measured dependencies of mobility on the gate voltage, i.e., carrier concentration, and identify the…
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