Magnetic domain structure of epitaxial Gd films grown on W(110)
Patrick H\"artl, Markus Leisegang, and Matthias Bode

TL;DR
This study uses spin-polarized scanning tunneling microscopy to analyze the magnetic domain structures of epitaxial Gd films on W(110), revealing how growth conditions and film thickness influence domain patterns and magnetic reorientation.
Contribution
It provides detailed real-space imaging and analysis of Gd film magnetic domains, including the effects of growth parameters and thickness on domain structure and reorientation.
Findings
Optimal growth conditions reduce surface defects.
Low coverage Gd films show micrometer-sized domains.
Stripe domains form above a critical thickness, indicating spin reorientation.
Abstract
We present a detailed real-space spin-polarized scanning tunneling microscopy (SP-STM) study of the magnetic domain structure of Gd(0001) films epitaxially grown on W(110). To find optimal preparation conditions, the influence of the substrate temperature during deposition and of the post-growth annealing temperature was investigated. Our results show that the lowest density of surface defects, such as step edges as well as screw and edge dislocations, is obtained for room temperature deposition and subsequent annealing at 900\,K. SP-STM data reveal small-sized magnetic domains at lower annealing temperatures, evidently caused by pinning at grain boundaries and other crystalline defects. The coverage-dependent magnetic domain structure of optimally prepared Gd films was systematically investigated. For low coverage up to about 80 atomic layers (AL) we observe m-sized domains…
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