Impact of helium ion implantation dose and annealing on dense near-surface layers of NV centers
A. Berzins, H. Grube, E. Sprugis, G. Vaivars, and I. Fescenko

TL;DR
This study investigates how helium ion implantation dose and annealing temperature affect the properties of NV centers in diamonds, aiming to optimize their use in high-sensitivity sensing and imaging.
Contribution
It provides experimental data on the effects of varying helium ion doses and annealing steps on NV center density and sensor sensitivity, suggesting pathways for performance enhancement.
Findings
Tripling the implantation dose increases magnetic sensitivity by 28%.
Higher implantation doses could improve sensitivity by up to 70%.
Additional annealing at 1100°C yields only a 6.6% sensitivity improvement.
Abstract
Implantation of diamonds with helium ions becomes a common method to create hundreds-nanometers-thick near-surface layers of NV centers for high-sensitivity sensing and imaging applications. However, optimal implantation dose and annealing temperature is still a matter of discussion. In this study, we irradiated HPHT diamonds with an initial nitrogen concentration of 100 ppm using different implantation doses of helium ions to create 200-nm thick NV layers. We compare a previously considered optimal implantation dose of to double and triple doses by measuring fluorescence intensity, contrast, and linewidth of magnetic resonances, as well as longitudinal and transversal relaxation times and . From these direct measurements we also estimate concentrations of P1 and NV centers. In addition, we compare the three diamond samples that underwent three consequent…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
