Self-aligned patterning technique for fabricating high-performance diamond sensor arrays with nanoscale precision

TL;DR

This paper introduces a simple self-aligned patterning method for creating diamond sensor arrays with nanoscale accuracy, enhancing quantum sensing and information processing capabilities.

Contribution

A novel self-aligned patterning technique based on conventional technology achieves ~15nm doping precision in diamond sensors.

Findings

Fabricated diamond nanopillar sensor arrays with high consistency.

Achieved a saturated fluorescence rate of 4.65 Mcps.

Reported the best fluorescence-dependent detection sensitivity of 1900 cps^(-1/2).

Abstract

To efficiently align the creation of defect center with photonics structure in nanoscale precision is one of the outstanding challenges for realizing high-performance photonic devices and the application in quantum technology such as quantum sensing, scalable quantum systems, and quantum computing network. Here, we propose a facile self-aligned patterning technique wholly based on conventional engineering technology, with the doping precision can reach ~15nm. Specifically, we demonstrate this technique by fabricating diamond nanopillar sensor arrays, which show high consistency and near-optimal photon counts, high yield approaching the theoretical limit, and high filtering efficiency for different NV centers. Combined with appropriate crystal orientation, a saturated fluorescence rate of 4.65 Mcps and the best reported fluorescence-dependent detection sensitivity of 1900 cps^(-1/2) are achieved. This technique applicable to all similar solid-state systems should facilitate the development of parallel quantum sensing and scalable information processing.