Local ultra-densification of single-walled carbon nanotube films: modeling and experiment

TL;DR

This paper demonstrates nanoscale patterning of single-walled carbon nanotube films using atomic force microscope lithography, supported by models of mechanical behavior, enabling tunable optical properties for nanostructured metasurfaces.

Contribution

It introduces a novel AFML technique for patterning SWCNT films and provides models for their mechanical and optical behavior, advancing metasurface fabrication.

Findings

Successful nanoscale patterning of SWCNT films achieved

Models accurately describe bundling and stability phenomena

Optical reflection properties can be tuned via patterning

Abstract

Fabrication of nanostructured metasurfaces poses a significant technological and fundamental challenge. Despite developing novel systems that support reversible elongation and distortion, their nanoscale patterning and control of optical properties remain an open problem. Herein we report the atomic force microscope lithography (AFML) application for nanoscale patterning of single-walled carbon nanotube films and the associated reflection coefficient tuning. We present models of bundling reorganization, formed-pattern stability, and energy distribution describing mechanical behavior with mesoscopic distinct element method (MDEM). All observed and calculated phenomena support each other and present a platform for developing AFML patterned optical devices using meshy nanostructured matter.