Designing Ultra-Flat Bands in Twisted Bilayer Materials at Large Twist Angles without specific degree
Shengdan Tao, Xuanlin Zhang, Jiaojiao Zhu, Pimo He, Shengyuan A. Yang,, Yunhao Lu, Su-Huai Wei

TL;DR
This paper introduces a novel approach to create ultra-flat electronic bands in twisted bilayer 2D materials at large twist angles, overcoming previous limitations of small-angle requirements, by leveraging large band edge energy differences and interlayer interactions.
Contribution
It proposes a new design principle for achieving ultra-flat bands at large twist angles in 2D semiconductors, demonstrated with alpha-In2Se3 and InSe, expanding the potential for practical applications.
Findings
Ultra-flat bands achieved at twist angles around 13 degrees.
Flat bands are less sensitive to twist angle variations.
External gate fields can further control flat band properties.
Abstract
Inter-twisted bilayers of two-dimensional (2D) materials can host low-energy flat bands, which offer opportunity to investigate many intriguing physics associated with strong electron correlations. In the existing systems, ultra-flat bands only emerge at very small twist angles less than a few degrees, which poses challenge for experimental study and practical applications. Here, we propose a new design principle to achieve low-energy ultra-flat bands with increased twist angles. The key condition is to have a 2D semiconducting material with large energy difference of band edges controlled by stacking. We show that the interlayer interaction leads to defect-like states under twisting, which forms a flat band in the semiconducting band gap with dispersion strongly suppressed by the large energy barriers in the moire superlattice even for large twist angles. We explicitly demonstrate our…
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