Computational Pattern Making from 3D Garment Models
Nico Pietroni, Corentin Dumery, Raphael Guenot-Falque, Mark Liu,, Teresa Vidal-Calleja, Olga Sorkine-Hornung

TL;DR
This paper introduces a novel method for automatically generating sewing patterns from 3D garment models, considering tailoring constraints and fabric properties, enabling efficient and customizable garment manufacturing.
Contribution
It adapts patch layout techniques for pattern making, explicitly modeling fabric deformation and tailoring constraints, and supports user interaction and multiple garment poses.
Findings
Successfully generates sewing patterns respecting fabric and tailoring constraints.
Handles various garment types, including tight and loose fits.
Allows user input for pattern customization.
Abstract
We propose a method for computing a sewing pattern of a given 3D garment model. Our algorithm segments an input 3D garment shape into patches and computes their 2D parameterization, resulting in pattern pieces that can be cut out of fabric and sewn together to manufacture the garment. Unlike the general state-of-the-art approaches for surface cutting and flattening, our method explicitly targets garment fabrication. It accounts for the unique properties and constraints of tailoring, such as seam symmetry, the usage of darts, fabric grain alignment, and a flattening distortion measure that models woven fabric deformation, respecting its anisotropic behavior. We bootstrap a recent patch layout approach developed for quadrilateral remeshing and adapt it to the purpose of computational pattern making, ensuring that the deformation of each pattern piece stays within prescribed bounds of…
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