Sputtering power effects on the electrochromic properties of NiO films
Juan R. Abenuz Acu\~na, Israel Perez, Victor Sosa, Fidel Gamboa, Jose, T. Elizalde, Rurik Farias, Diana Carrillo, Jose L. Enriquez, Andres Burrola,, Pierre Mani

TL;DR
This study investigates how varying sputtering power influences the structural, morphological, electrochromic, and chemical properties of NiO films deposited via RF magnetron sputtering, revealing significant effects on performance and composition.
Contribution
It provides new insights into the relationship between sputtering power and the electrochromic performance and chemical composition of NiO films, which was not previously detailed.
Findings
Higher sputtering power reduces coloration efficiency.
Increased sputtering power decreases electrochromic reversibility.
Ion diffusion is greater at lower sputtering powers.
Abstract
The effect of sputtering power (=60 W-180 W) on the electrochromic properties of nickel oxide films deposited on ITO-coated glass substrates by the RF magnetron sputtering technique was investigated. Crystalline structure and morphology were assessed by X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. The effect of sputtering power on electrochromism of the samples was evaluated with cyclic voltammetry and chronoamperometry. We used LiClO in propilene carbonate solution for Li insertion/extraction. The chemical composition of the samples before and after Li intercalation was analyzed by X-ray photoelectron spectroscopy (XPS). We observed the cubic phase of NiO with sputtering power mainly affecting crystallinity and grain size. These in turn affect the electrochromic properties. Coloration efficiency reduces from 24.4 cm/C to (15.4, 13.7. 16.1)…
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