Substitutional Doped GeSe: Tunable Oxidative States with Strain Engineering
Zheng Shu, Yongqing Cai

TL;DR
This study uses first-principles calculations to investigate substitutional doping in GeSe, revealing how different metallic dopants and strain influence electronic states, oxidation levels, and potential applications in resistive switching and photocatalysis.
Contribution
It systematically analyzes various metallic dopants in GeSe and their effects on electronic properties and oxidation states, including strain-induced state shifts, offering insights for nanoelectronic applications.
Findings
Al doping suggests high mobility and resistive switching potential.
Localized states appear with Fe, Co, Ni doping, affecting electronic properties.
Au doping enhances photocatalytic and plasmonic features.
Abstract
Layered chalcogenide materials have a wealth of nanoelectronics applications like resistive switching and energy-harvesting such as photocatalyst owing to rich electronic, orbital, and lattice excitations. In this work, we explore monochalcogenide germanium selenide GeSe with respect to substitutional doping with 13 metallic cations by using first-principles calculations. Typical dopants including s-shell (alkali elements Li and Na), p-shell (Al, Pb and Bi), 3d (Fe, Cu, Co and Ni), 4d (Pd and Ag) and 5d (Au and Pt) elements are systematically examined. Amongst all the cationic dopants, Al with the highest oxidation states, implying a high mobility driven by electric field, and Al-doped GeSe may be a promising candidate for novel resistive switching devices. We show that there exist many localized induced states in the band gap of GeSe upon doping Fe, Co, or Ni, while for Cu, Ag, and Au…
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