Disconnection-Mediated Twin/Twin-Junction Migration in FCC metals
Mingjie Xu, Kongtao Chen, Fan Cao, Leonardo Velasco Estrada, Thomas M., Kaufman, Fan Ye, Horst Hahn, Jian Han, David J. Srolovitz, Xiaoqing Pan

TL;DR
This study combines in situ HRTEM, MD simulations, and disconnection theory to reveal how grain boundary motion and triple junction migration occur in FCC metals, highlighting the role of disconnections and their dependence on driving forces.
Contribution
It provides a comprehensive understanding of disconnection-mediated grain boundary and triple junction migration mechanisms in FCC metals, integrating experimental and simulation insights.
Findings
107° triple junction readily migrates, 70° is immobile.
Disconnections can form at triple junctions and free surface junctions.
Migration modes depend on the driving force, such as chemical potential or stress.
Abstract
We present the results of novel, time-resolved, in situ HRTEM observations, molecular dynamics (MD) simulations, and disconnection theory that elucidate the mechanism by which the motion of grain boundaries (GBs) in polycrystalline materials are coupled through disconnection motion/reactions at/adjacent to GB triple junctions (TJs). We focus on TJs composed of a pair of coherent twin boundaries (CTBs) and a {\Sigma}9 GB. As for all GBs, disconnection theory implies that multiple modes/local mechanisms for CTB migration are possible and that the mode selection is affected by the nature of the driving force for migration. While we observe (HRTEM and MD) CTB migration through the motion of pure steps driven by chemical potential jump, other experimental observations (and our simulations) show that stress-driven CTB migration occurs through the motion of disconnections with a non-zero…
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Taxonomy
TopicsMicrostructure and mechanical properties · Force Microscopy Techniques and Applications · Magnetic properties of thin films
