Thin film growth of MAX phases as functional materials

TL;DR

This paper reviews the progress in epitaxial growth techniques and properties of MAX phase thin films, highlighting their potential for advanced technological applications due to their unique combined ceramic and metallic properties.

Contribution

It provides a comprehensive summary of current methods and future directions for high-quality epitaxial MAX phase thin film growth and engineering.

Findings

Advances in epitaxial growth techniques for MAX phases

Potential for next-generation technological applications

Future research directions in thin film synthesis

Abstract

Layered nanolaminate ternary carbides, nitrides and carbonitrides with general formula Mn+1AXn or MAX (n = 1, 2, or 3, M is an early transition metal, A is mostly group 13 or 14 element, and X is C and/or N) has revolutionized the world of nanomaterials, due to the coexistence of both ceramic and metallic nature, giving rise to exceptional mechanical, thermal, electrical, chemical properties and wide range of applications. Although several solid-state bulk synthesis methods have been developed to produce a variety of MAX phases, however, for certain applications, the growth of MAX phases, especially in its high-quality epitaxial thin films form is of increasing interest. Here, we summarize the progress made thus far in epitaxial growth and property evaluation of MAX phase thin films grown by various deposition techniques. We also address the important future research directions to be made in terms of thin-film growth. Overall, in the future, high-quality single-phase epitaxial thin film growth and engineering of chemically diverse MAX phases may open up interesting new avenues for next-generation technology.