Heteroepitaxy of FCC-on-FCC Systems of Large Misfit
Paul Wynblatt (CMU), Dominique Chatain (CINaM), Ulrich Dahmen (NCEM)

TL;DR
This study uses molecular dynamics simulations to analyze how lattice mismatch influences the orientation relationships and interfacial structures of FCC films grown on FCC substrates with various orientations and mismatches.
Contribution
It systematically investigates the effects of lattice mismatch and substrate orientation on ORs and interfacial structures in FCC heteroepitaxy, revealing patterns largely independent of mismatch magnitude.
Findings
ORs vary systematically with substrate orientation
Pattern of OR variation is similar across different mismatch systems
Mismatch influences local interfacial structures and defect formation
Abstract
To understand the effects of lattice mismatch on heteroepitaxial growth, we have studied the equilibrium structure and orientation relationships (ORs) of FCC films grown epitaxially on FCC substrates, using molecular dynamics simulations in conjunction with embedded atom method potentials. Three film/substrate systems have been investigated, namely: Ag on Cu, Ag on Ni and Pb on Al. These systems cover a significant range of lattice mismatch, from 12.6% for Ag/Cu to 21.8% for Pb/Al. For each system, the ORs of films on six different substrate orientations, namely: (100), (511), (311), (211), (322) and (111), have been investigated. Films on these susbstrates cover a gradual transition from the oct-cube orientation relationship, which occurs only on (100) substrates, to the heterotwin orientation relationship, which often occurs on (111) substrates. It is found that the resulting ORs vary…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsCopper Interconnects and Reliability · Semiconductor materials and interfaces · Metal and Thin Film Mechanics
