Nanoscale laser flash measurements of diffuson transport in amorphous Ge and Si

TL;DR

This study uses nanoscale laser flash measurements to investigate vibrational heat transport in amorphous Ge and Si, revealing diffusons and propagons as primary heat carriers with mean free paths under a few nanometers.

Contribution

It demonstrates a novel experimental approach to distinguish vibrational modes responsible for heat conduction in amorphous materials.

Findings

Thermal conductivity is approximately 0.4 W/(m-K) for amorphous Ge.

Thermal conductivity is approximately 0.6 W/(m-K) for amorphous Si.

Heat is mainly carried by diffusons and propagons with very short mean free paths.

Abstract

The thermal properties of amorphous materials have attracted significant attention due to their technological importance in electronic devices. Additionally, the disorder-induced breakdown of the phonon gas model makes vibrational transport in amorphous materials a topic of fundamental interest. In the past few decades, theoretical concepts such as propagons, diffusons, and locons have emerged to describe different types of vibrational modes in disordered solids. But experiments can struggle to accurately determine which types of vibrational states carry the majority of the heat. In the present study, we use nanoscale laser flash measurements (front/back time-domain thermoreflectance) to investigate thermal transport mechanisms in amorphous Ge and amorphous Si thin-films. We observe a nearly linear relationship between the amorphous film's thermal resistance and the film's thickness. The slope of the film's thermal resistance vs. thickness corresponds to a thickness-independent thermal conductivity of 0.4 and 0.6 W/(m-K) for a-Ge and a-Si, respectively. This result reveals that the majority of heat currents in amorphous Si and Ge thin films prepared via RF sputtering at room temperature are carried by diffusons and/or propagons with mean free paths less than a few nanometers.